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Oxygen and hydrogen accumulation at buried implantation-damage layers in hydrogen- and helium-implanted Czochralski silicon

โœ Scribed by R. Job; A.G. Ulyashin; W.R. Fahrner; A.I. Ivanov; L. Palmetshofer


Book ID
106022967
Publisher
Springer
Year
2001
Tongue
English
Weight
152 KB
Volume
72
Category
Article
ISSN
1432-0630

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