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Effect of uniform stress on silicon implanted with helium, hydrogen and oxygen

✍ Scribed by A Misiuk; J Bak-Misiuk; I.V Antonova; V Raineri; A Romano-Rodriguez; A Bachrouri; H.B Surma; J Ratajczak; J Katcki; J Adamczewska; E.P Neustroev

Book ID
117626621
Publisher
Elsevier Science
Year
2001
Tongue
English
Weight
556 KB
Volume
21
Category
Article
ISSN
0927-0256

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