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Oxidation behaviour of LPCVD silicon oxynitride films

✍ Scribed by A.E.T. Kuiper; M.F.C. Willemsen; J.M.G. Bax; F.H.P.H. Habraken

Publisher: Elsevier Science
Year: 1988
Tongue: English
Weight: 365 KB
Volume: 33-34
Category: Article
ISSN: 0169-4332
DOI: 10.1016/0169-4332(88)90377-7

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