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Orientation and strain of single and double CoSi2 epitaxial layers formed by ion implantation

✍ Scribed by A. Vantomme; M.F. Wu; G. Langouche; K. Maex; H. Vanderstraeten; Y. Bruynseraede


Book ID
113281622
Publisher
Elsevier Science
Year
1991
Tongue
English
Weight
463 KB
Volume
59-60
Category
Article
ISSN
0168-583X

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