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Formation of buried CoSi2 layers by ion implantation and their stability at high temperatures

✍ Scribed by M.F. Wu; A. Vantomme; H. Pattyn; G. Langouche; K. Maex; J. Vanhellemont

Publisher: Elsevier Science
Year: 1989
Tongue: English
Weight: 436 KB
Volume: 38
Category: Article
ISSN: 0169-4332
DOI: 10.1016/0169-4332(89)90541-2

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