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Formation of buried CoSi2 layers with ion beam synthesis at low implantation energies

✍ Scribed by R. Jebasinski; S. Mantl; L. Vescan; Ch. Dieker

Publisher
Elsevier Science
Year
1991
Tongue
English
Weight
670 KB
Volume
53
Category
Article
ISSN
0169-4332

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πŸ“œ SIMILAR VOLUMES

Synthesis of thin buried CoSi2 layers by
Synthesis of thin buried CoSi2 layers by low energy cobalt implantation
✍ R. Jebasinski; S. Mantl; Ch. Dieker πŸ“‚ Article πŸ“… 1992 πŸ› Elsevier Science 🌐 English βš– 354 KB

The formation of Si/CoSi 2/Si heterostructures by high-dose cobalt implantation was studied for the range of implantation energy 20-200 keV. Various implantation and post-implantation annealing procedures were investigated in order to determine the conditions for producing the thinnest possible CoSi