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Formation of buried CoSi2 layers by ion implantation, studied by Mössbauer spectroscopy and rutherford backscattering spectroscopy

✍ Scribed by A. Vantomme; M.F. Wu; I. Dézsi; G. Langouche; K. Maex; J. Vanhellemont

No coin nor oath required. For personal study only.

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