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Optimum Thickness of SiO 2 Layer Formed at the Interface of N-ZnO/P-Si Photodiodes

✍ Scribed by Choi, Youn Sung; Lee, Joon Yup; Choi, Won Hoon; Yeom, Han Woong; Im, Seongil


Book ID
125543742
Publisher
Institute of Pure and Applied Physics
Year
2002
Tongue
English
Weight
104 KB
Volume
41
Category
Article
ISSN
0021-4922

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Measurement of the interface layer thick
✍ Easwarakhanthan, T.; Alnot, P. πŸ“‚ Article πŸ“… 1998 πŸ› John Wiley and Sons 🌐 English βš– 161 KB

A procedure for the determination of the interface layer thickness between the bulk Ðlm and the Si substrate SiO 2 from single-wavelength null ellipsometric data is described. The e †ect of the angular errors in the angle of incidence is eliminated because it is found along with the Ðlm and interfac