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Optimized lithography and etching processes for a magnetic oxide micro-device

✍ Scribed by R. Soulimane; M. Koubaa; A. M. Haghiri-Gosnet; B. Mercey; W. Prellier; Ph. Lecoeur; G. Poullain; R. Bouregba

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

A General Etching Simulator for VLSI Lit

✍ Oldham, W.G.; Neureuther, A.R.; Chiakang Sung; Reynolds, J.L.; Nandgaonkar, S.N. 📂 Article 📅 1980 🏛 IEEE 🌐 English ⚖ 745 KB

Optimized Micro- and Nanostructures for

✍ Daniel Fruchart; Patricia de Rango; Salvatore Miraglia; Sophie Rivoirard 📂 Article 📅 2005 🏛 John Wiley and Sons ⚖ 8 KB

A general simulator for VLSI lithography

✍ Oldham, W.G.; Nandgaonkar, S.N.; Neureuther, A.R.; O'Toole, M. 📂 Article 📅 1979 🏛 IEEE 🌐 English ⚖ 791 KB

A general simulator for VLSI lithography

✍ Oldham, W.G.; Neureuther, A.R.; Chiakang Sung; Reynolds, J.L.; Nandgaonkar, S.N. 📂 Article 📅 1980 🏛 IEEE 🌐 English ⚖ 449 KB

Hybrid lithography: The marriage between

✍ Steven Steen; Sharee J. McNab; Lidija Sekaric; Inna Babich; Jyotica Patel; Jim B 📂 Article 📅 2006 🏛 Elsevier Science 🌐 English ⚖ 305 KB

Multi-pole magnetization of NdFeB magnet

✍ J. Töpfer; B. Pawlowski; H. Beer; K. Plötner; P. Hofmann; J. Herrfurth 📂 Article 📅 2004 🏛 Elsevier Science 🌐 English ⚖ 461 KB