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A general simulator for VLSI lithography and etching processes: Part II—Application to deposition and etching

✍ Scribed by Oldham, W.G.; Neureuther, A.R.; Chiakang Sung; Reynolds, J.L.; Nandgaonkar, S.N.

Book ID: 114593482
Publisher: IEEE
Year: 1980
Tongue: English
Weight: 449 KB
Volume: 27
Category: Article
ISSN: 0018-9383
DOI: 10.1109/t-ed.1980.20056

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