A Level Set Approach to a Unified Model for Etching, Deposition, and Lithography I: Algorithms and Two-Dimensional Simulations

A Level Set Approach to a Unified Model

A Level Set Approach to a Unified Model for Etching, Deposition, and Lithography

✍ D. Adalsteinsson; J.A. Sethian 📂 Article 📅 1997 🏛 Elsevier Science 🌐 English ⚖ 853 KB

Previously, Adalsteinsson and Sethian have applied the level set formulation to the problem of surface advancement in two and three-dimensional topography simulation of deposition, etching, and lithography processes in integrated circuit fabrication. The level set formulation is based on solving a H