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A General Etching Simulator for VLSI Lithography and Etching Processes: Part II - Application to Deposition and Etching

✍ Scribed by Oldham, W.G.; Neureuther, A.R.; Chiakang Sung; Reynolds, J.L.; Nandgaonkar, S.N.

Book ID: 119797967
Publisher: IEEE
Year: 1980
Tongue: English
Weight: 745 KB
Volume: 15
Category: Article
ISSN: 0018-9200
DOI: 10.1109/jssc.1980.1051432

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