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Optimization of reactive ion etching processes using desirability

✍ Scribed by Stephan Brabender; Klaus T. Kallis; Lars O. Keller; Remigius R. Poloczek; Horst L. Fiedler

Publisher: Elsevier Science
Year: 2010
Tongue: English
Weight: 230 KB
Volume: 87
Category: Article
ISSN: 0167-9317
DOI: 10.1016/j.mee.2009.11.153

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