Deep reactive ion etching and focused io
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G. Villanueva; J.A. Plaza; A. SΓ‘nchez-Amores; J. Bausells; E. MartΓnez; J. Samit
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Article
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2006
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Elsevier Science
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English
β 281 KB
We have studied the fabrication of high-aspect ratio silicon tips by a combination of deep reactive ion etching and focused ion beam. The reactive ion etching is used to obtain so-called "rocket tips" which can be fabricated with a high aspect ratio. The rocket tips are further processed by using a