𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Deep reactive ion etching of PMMA

✍ Scribed by Congchun Zhang; Chunsheng Yang; Duifu Ding


Publisher
Elsevier Science
Year
2004
Tongue
English
Weight
205 KB
Volume
227
Category
Article
ISSN
0169-4332

No coin nor oath required. For personal study only.


πŸ“œ SIMILAR VOLUMES


Deep reactive ion etching and focused io
✍ G. Villanueva; J.A. Plaza; A. SΓ‘nchez-Amores; J. Bausells; E. MartΓ­nez; J. Samit πŸ“‚ Article πŸ“… 2006 πŸ› Elsevier Science 🌐 English βš– 281 KB

We have studied the fabrication of high-aspect ratio silicon tips by a combination of deep reactive ion etching and focused ion beam. The reactive ion etching is used to obtain so-called "rocket tips" which can be fabricated with a high aspect ratio. The rocket tips are further processed by using a