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Simulation of reactive ion-etching processes considering sheath dynamics

✍ Scribed by A. Fischelscher; I.W. Rangelow; R. Kassing

Publisher: Elsevier Science
Year: 1991
Tongue: English
Weight: 58 KB
Volume: 139
Category: Article
ISSN: 0921-5093
DOI: 10.1016/0921-5093(91)90651-3

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