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Optimisation of rim phase shift masks for contact holes

โœ Scribed by Z. Cui; P.D. Prewett; B. Martin


Publisher
Elsevier Science
Year
1994
Tongue
English
Weight
330 KB
Volume
23
Category
Article
ISSN
0167-9317

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Results are presented from investigations into the UV properties of various oxide, nitride, and intermetallic materials for application as attenuated phase shift masking films for 248 and 193 nm wavelengths. There are several materials which are potential candidates as attenuating phase shifting fil