✦ LIBER ✦
AlSixNy as an embedded layer for attenuated phase-shifting mask in 193 nm and the utilization of a chemically amplified negative resist NEB-22 for maskmaking
✍ Scribed by Wen-an Loong; Cheng-ming Lin
- Publisher
- Elsevier Science
- Year
- 2000
- Tongue
- English
- Weight
- 342 KB
- Volume
- 53
- Category
- Article
- ISSN
- 0167-9317
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