✦ LIBER ✦
Reduction of CD variance by using optical proximity correction for patterning with DUV phase shift mask
✍ Scribed by H. Zhang
- Publisher
- Elsevier Science
- Year
- 1996
- Tongue
- English
- Weight
- 263 KB
- Volume
- 30
- Category
- Article
- ISSN
- 0167-9317
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