๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

Optical characterization of chemical beam epitaxy grown Ga0.52In0.48P layers and related microstructures

โœ Scribed by A. Hassine; J. Sapriel; M. Nunez; P. Le Berre; P. Legay; F. Alexandre; G. Post; G. Le Roux


Publisher
Elsevier Science
Year
1994
Tongue
English
Weight
328 KB
Volume
28
Category
Article
ISSN
0921-5107

No coin nor oath required. For personal study only.

โœฆ Synopsis


Ga0.521n0.48 P layers grown by chemical beam epitaxy (CBE) and lattice matched to (100) GaAs were investigated by spectroscopic methods (Raman, BriUouin and ellipsometry). For the first time, the acoustic properties of this crystal were measured, as well as the variation of the real part of the refractive index over a large energy range including the crystal band gap. Selective area epitaxy (SAE) was characterized by combining spatially resolved (1/am) Raman and photoluminescence studies. An In enrichment (maximum, 2.5%) was observed for narrow stripes (less than 5/am) and also when the limits of the mask were approached at distances smaller than 5/am. The advantages of CBE with respect to the other techniques were clearly demonstrated in the case of SAE. Finally, the importance of light scattering for structural and compositional characterizations was demonstrated for GaAs/Ga0521n0.48P superlattices from the measurements of the folded acoustic mode Raman shifts.


๐Ÿ“œ SIMILAR VOLUMES


Fabrication and characteristics of In0.4
โœ S.F. Yoon; B.P. Gay; H.Q. Zheng; K.S. Ang; H. Wang; G.I. Ng ๐Ÿ“‚ Article ๐Ÿ“… 1999 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 313 KB

In 0.48 Ga 0.52 P/In 0.20 Ga 0.80 As/GaAs pseudomorphic high electron mobility transistor (p-HEMT) structures were grown by solid-source molecular beam epitaxy (SSMBE) using a valved phosphorus cracker cell. The electron mobility and sheet carrier density at room temperature were 1700 cm 2 /Vs and 3