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Optical and electrical properties of a-SixNy:H films prepared by rf plasma using N2+SiH4 gas mixtures

✍ Scribed by E. Bertran; J.M. López-Villegas; J.L. Andújar; J. Campmany; A. Canillas; J.R. Morante

No coin nor oath required. For personal study only.

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