## Abstract The effect of bias voltage on characteristics of ZnO thin films deposited by the electron cyclotron resonance plasmaโenhanced chemical vapor deposition (ECRโPECVD) method was investigated. The structural, optical and electrical properties of ZnO thin films were studied as a function of
โฆ LIBER โฆ
Optical and electrical properties of a-C:H deposited by magnetic confinement of r.f. PECVD plasma
โ Scribed by Tomozeiu, N; Hart, A; Kleinsorge, B; Milne, W.I
- Book ID
- 121885601
- Publisher
- Elsevier Science
- Year
- 1999
- Tongue
- English
- Weight
- 185 KB
- Volume
- 8
- Category
- Article
- ISSN
- 0925-9635
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