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On the influence of sputter etch cleaning on the silicidation, the thermal stability and the electrical characteristics of Ti/p−Si contacts

✍ Scribed by A.S. Vercaemst; R.L. Van Meirhaeghe; W.H. Laflère; F. Cardon; W. De Bosscher; R.J. Schreutelkamp

Publisher: Elsevier Science
Year: 1993
Tongue: English
Weight: 739 KB
Volume: 36
Category: Article
ISSN: 0038-1101
DOI: 10.1016/0038-1101(93)90246-m

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