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On the electrical properties, the interfacial reactivity and the thermal stability of CoSi2/-, TiSi2/-, Co/- and Ti/p-InP Schottky barriers

✍ Scribed by L.M.O. Van den Berghe; R.L. Van Meirhaeghe; W.H. Laflère; F. Cardon

Publisher: Elsevier Science
Year: 1990
Tongue: English
Weight: 605 KB
Volume: 33
Category: Article
ISSN: 0038-1101
DOI: 10.1016/0038-1101(90)90013-5

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