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On the fluence dependence of the sputtering yield for low-energy noble gas ions

✍ Scribed by J. Kirschner; H. W. Etzkorn


Publisher
Springer
Year
1982
Tongue
English
Weight
729 KB
Volume
29
Category
Article
ISSN
1432-0630

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## Abstract In this paper we present a method of deriving the ion energy reflection coefficient __R__ ~E~ from simultaneous measurements of the current‐ and energy flux density as functions of the bias voltage applied. __R__ ~E~ is measured as a function of the angle in a low temperature magnetized