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On the effect of low-energy ion bombardment on polystyrene and polymethylmethacrylate etch rates in rf plasmas

✍ Scribed by E. Occhiello; F. Garbassi; J. W. Coburn

Publisher: Springer
Year: 1989
Tongue: English
Weight: 481 KB
Volume: 9
Category: Article
ISSN: 0272-4324
DOI: 10.1007/bf01015823

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