Post-annealing effect in reactive r.f.-m
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Chen, G. L.; Li, Y.; Lin, J.; Huan, C. H. A.; Guo, Y. P.
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Article
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1999
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John Wiley and Sons
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English
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Thin films of CN x were deposited by reactive r.f.-magnetron sputtering on Si(100) substrates. The effect of annealing temperatures on the structural properties of the films has been studied by Fourier transform infrared (FTIR) spectroscopy, x-ray photoelectron spectroscopy (XPS) and transmission el