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Morphology and stability of (Ti0.9Zr0.1) Si2 thin films on Si(111) and Si(100) formed in UHV

โœ Scribed by Y. Dao; D.E. Sayers; R.J. Nemanich


Publisher
Elsevier Science
Year
1995
Tongue
English
Weight
678 KB
Volume
270
Category
Article
ISSN
0040-6090

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