✦ LIBER ✦

On problems of reaction kinetics during deposition of silicon oxide films by reactive sputtering of silicon in a magnetron sputtering system

✍ Scribed by Brodkorb, W. ;Salm, J. ;Steinbeiss, Ch. ;Steinbeiss, E.

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Low-temperature deposition of silicon ox

✍ Luís da Silva Zambom; Ronaldo Domingues Mansano; Ana Paula Mousinho 📂 Article 📅 2009 🏛 Elsevier Science 🌐 English ⚖ 247 KB

Deposition of tin-doped indium oxide fil

✍ A.A. Karim; C. Deshpandey; H.J. Doerr; R.F. Bunshah 📂 Article 📅 1989 🏛 Elsevier Science 🌐 English ⚖ 568 KB

Influence of temperature and hydrogen ra

✍ S. Chausserie; N. Khalfaoui; C. Dufour; J. Vicens; P. Marie; F. Gourbilleau 📂 Article 📅 2005 🏛 Elsevier Science 🌐 English ⚖ 409 KB

1.8 Influence of defects in the silicon

✍ D Kropman; M Vinnal; P Putk 📂 Article 📅 1977 🏛 Elsevier Science 🌐 English ⚖ 617 KB

The influence of deposition parameters o

✍ A.K. Batabyal; P. Chaudhuri; Swati Ray; A.K. Barua 📂 Article 📅 1984 🏛 Elsevier Science 🌐 English ⚖ 415 KB

Discussion of Possible Surface Processes

✍ Brodkorb, W. ;Salm, J. ;Steinbeiss, E. 📂 Article 📅 1984 🏛 John Wiley and Sons 🌐 English ⚖ 486 KB