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Influence of temperature and hydrogen rate on silicon incorporation in silica films by reactive magnetron co-sputtering

โœ Scribed by S. Chausserie; N. Khalfaoui; C. Dufour; J. Vicens; P. Marie; F. Gourbilleau


Publisher
Elsevier Science
Year
2005
Tongue
English
Weight
409 KB
Volume
27
Category
Article
ISSN
0925-3467

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