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Influence of defects in the silicon wafer on the properties of silicon oxide films formed by reactive sputtering : D. Kropman, M. Vinnal and P. Putk. Vacuum 27 (3) 125 (1977)


Publisher
Elsevier Science
Year
1977
Tongue
English
Weight
130 KB
Volume
16
Category
Article
ISSN
0026-2714

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