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Deposition of tin-doped indium oxide films by a modified reactive magnetron sputtering process

✍ Scribed by A.A. Karim; C. Deshpandey; H.J. Doerr; R.F. Bunshah


Publisher
Elsevier Science
Year
1989
Tongue
English
Weight
568 KB
Volume
172
Category
Article
ISSN
0040-6090

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## Indium -doped zinc oxide (ZnO : In) films were prepared by simultaneous r.f. and d.c. magnetron sputtering. The structural, optical and electrical properties of the films have been obtained by x-ray diffractometry (XRD), Rutherford backscattering spectrometry (RBS), spectrophotometry and atomic