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Deposition of copper oxide, titanium oxide and indium tin oxide films by reactive magnetron sputtering

✍ Scribed by DN Popov; PI Docheva

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Deposition of tin-doped indium oxide fil

✍ A.A. Karim; C. Deshpandey; H.J. Doerr; R.F. Bunshah 📂 Article 📅 1989 🏛 Elsevier Science 🌐 English ⚖ 568 KB

Study of annealed indium tin oxide films

✍ Li-jian Meng; A Maçarico; R Martins 📂 Article 📅 1995 🏛 Elsevier Science 🌐 English ⚖ 813 KB

Rf reactive sputtering of indium-tin-oxi

✍ V Tvaroěk; I Novotný; R Harman; J Kováč 📂 Article 📅 1986 🏛 Elsevier Science 🌐 English ⚖ 300 KB

Properties of indium tin oxide films wit

✍ A.H.M. Zahirul Alam; Yoshinori Takashima; Kimihiro Sasaki; Tomonobu Hata 📂 Article 📅 1996 🏛 Elsevier Science 🌐 English ⚖ 361 KB

Physical investigations of DC magnetron

✍ S Uthanna; PS Reddy; BS Naidu; P Jayarama Reddy 📂 Article 📅 1996 🏛 Elsevier Science 🌐 English ⚖ 301 KB

Characterization of tin oxide thin films

✍ F.C. Stedile; B.A.S. De Barros Jr.; C.V.Barros Leite; F.L. Freire Jr.; I.J.R. Ba 📂 Article 📅 1989 🏛 Elsevier Science 🌐 English ⚖ 367 KB