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On angle resolved RF magnetron sputtering of Ge–Sb–Te thin films

✍ Scribed by J. Gutwirth; T. Wágner; P. Bezdička; M. Hrdlička; Mil. Vlček; M. Frumar

Book ID
116671763
Publisher
Elsevier Science
Year
2009
Tongue
English
Weight
570 KB
Volume
355
Category
Article
ISSN
0022-3093

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Ag nanostructures on TiO 2 films were deposited by RF magnetron sputtering under variable deposition parameters, such as DC potential, RF-power and total pressure. The concentration, shape, and distribution of the deposited nanostructures and continuous Ag films on thin films of TiO 2 can be tailore