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Influences of Substrate Temperature on Structure, Electrical and Optical Properties of Magnetron Sputtering Ge2Sb2Te5 Films

โœ Scribed by Sun Huajun; Hou Lisong; Miao Xiangshui; Wu Yiqun

Book ID
108499474
Publisher
Elsevier
Year
2010
Weight
336 KB
Volume
39
Category
Article
ISSN
1875-5372

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dc reactive magnetron sputtering technique was employed for deposition of tantalum oxide films on quartz and silicon substrates by sputtering of pure tantalum target in the presence of oxygen and argon gases under various substrate temperatures in the range 303-973 K. The variation of cathode potent