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Substrate bias voltage influenced structural, electrical and optical properties of dc magnetron sputtered Ta2O5films

โœ Scribed by S. V. Jagadeesh Chandra; M. Chandrasekhar; G. Mohan Rao; S. Uthanna

Book ID
106398185
Publisher
Springer US
Year
2008
Tongue
English
Weight
479 KB
Volume
20
Category
Article
ISSN
0957-4522

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Effect of substrate temperature on the s
Effect of substrate temperature on the structural, optical and electrical properties of dc magnetron sputtered tantalum oxide films
โœ S.V. Jagadeesh Chandra; S. Uthanna; G. Mohan Rao ๐Ÿ“‚ Article ๐Ÿ“… 2008 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 669 KB

dc reactive magnetron sputtering technique was employed for deposition of tantalum oxide films on quartz and silicon substrates by sputtering of pure tantalum target in the presence of oxygen and argon gases under various substrate temperatures in the range 303-973 K. The variation of cathode potent