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O interstitial generation and diffusion in high temperature annealed Si/SiO2/Si structures

✍ Scribed by Devine, R. A. B.; Mathiot, D.; Warren, W. L.; Aspar, B.

Book ID: 111876184
Publisher: American Institute of Physics
Year: 1996
Tongue: English
Weight: 409 KB
Volume: 79
Category: Article
ISSN: 0021-8979
DOI: 10.1063/1.361155

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