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Low-Temperature RF Plasma Treatment of SiSiO2 Structures as a Substitution for High-Temperature Anneals

✍ Scribed by Alexandrova, S. ;Szekeres, A.

Publisher: John Wiley and Sons
Year: 1986
Tongue: English
Weight: 413 KB
Volume: 96
Category: Article
ISSN: 0031-8965
DOI: 10.1002/pssa.2210960144

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