๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

Numerical modelling of the processes of exposure and development in electron beam lithography on high temperature superconductor thin films

โœ Scribed by Y Gueorguiev; K Vutova; G Mladenov


Book ID
108453779
Publisher
Elsevier Science
Year
1998
Tongue
English
Weight
366 KB
Volume
47
Category
Article
ISSN
0378-4754

No coin nor oath required. For personal study only.


๐Ÿ“œ SIMILAR VOLUMES