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The effect of substrate and annealing temperatures on the microstructure of La1.85Sr0.15CuO4 thin film in pulsed electron deposition process

✍ Scribed by L.M. Chen; W.T. Liu; F.G. Zeng; Y.F. Guo; P.G. Li; W.H. Tang

Book ID: 116602073
Publisher: Elsevier Science
Year: 2008
Tongue: English
Weight: 467 KB
Volume: 456
Category: Article
ISSN: 0925-8388
DOI: 10.1016/j.jallcom.2007.02.025

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