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Different parameters for the deposition of La1.85Sr0.15CuO4 and Nd1.85Ce0.15CuO4 superconducting films by the novel pulsed electron deposition technique

✍ Scribed by Y.F. Guo; L.M. Chen; P.G. Li; J.Q. Shen; X. Guo; M. Lei; W.H. Tang

No coin nor oath required. For personal study only.

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