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Analysis of the proximity function in electron-beam lithography on high- superconducting thin-films

โœ Scribed by Gueorguiev, Y M; Vutova, K G; Mladenov, G M

Book ID
118167616
Publisher
Institute of Physics
Year
1996
Tongue
English
Weight
361 KB
Volume
9
Category
Article
ISSN
0953-2048

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๐Ÿ“œ SIMILAR VOLUMES

A Monte Carlo study of proximity effects
A Monte Carlo study of proximity effects in electron-beam patterning of high-Tc superconducting thin films
โœ Y.M. Gueorguiev; K.G. Vutova; G.M. Mladenov ๐Ÿ“‚ Article ๐Ÿ“… 1995 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 616 KB

In the present work the proximity effects during the electron-beam lithography of YBaeCu30 7 high temperature superconducting thin films deposited on two typical substrates (SrTiO 3 and MgO) were studied at various beam voltages (25, 50, and 75 kV) by means of the Monte Carlo simulation. The radial