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Nucleation kinetics during homoepitaxial growth of TiN(001) by reactive magnetron sputtering

✍ Scribed by Wall, Marcel A.; Cahill, David G.; Petrov, I.; Gall, D.; Greene, J. E.


Book ID
126954280
Publisher
The American Physical Society
Year
2004
Tongue
English
Weight
812 KB
Volume
70
Category
Article
ISSN
1098-0121

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Epitaxial metastable Hf 1 -x Al x N alloys with 0 ≀x ≀ 0.50 were grown on MgO(001) substrates at 600 Β°C by ultrahigh vacuum reactive magnetron sputtering from Hf and Al targets in 90% Ar + 10% N 2 discharges at 7 mTorr. X-Ray diffraction and cross-sectional transmission electron microscopy show that