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Kinetic properties of TiN thin films prepared by reactive magnetron sputtering

✍ Scribed by Solovan, M. N.; Brus, V. V.; Maryanchuk, P. D.; Kovalyuk, T. T.; Rappich, J.; Gluba, M.


Book ID
121356459
Publisher
SP MAIK Nauka/Interperiodica
Year
2013
Tongue
English
Weight
355 KB
Volume
55
Category
Article
ISSN
1063-7834

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Thin films of ZrO 2 were prepared by reactive magnetron sputtering. Annealing of the films exhibited a drastic change in the properties due to improved crystallinity and packing density. The root mean square roughness of the sample observed from atomic force microscope is about 5.75 nm which is comp