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Properties of ITO films prepared by reactive magnetron sputtering

✍ Scribed by Kleinhempel, Ronny ;Kaune, Gunar ;Herrmann, Matthias ;Kupfer, Hartmut ;Hoyer, Walter ;Richter, Frank

Publisher
Springer-Verlag
Year
2006
Weight
240 KB
Volume
156
Category
Article
ISSN
0344-838X

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Thin films of ZrO 2 were prepared by reactive magnetron sputtering. Annealing of the films exhibited a drastic change in the properties due to improved crystallinity and packing density. The root mean square roughness of the sample observed from atomic force microscope is about 5.75 nm which is comp