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Properties of silicon nitride films prepared by magnetron sputtering

✍ Scribed by Y. Hirohata; N. Shimamoto; T. Hino; T. Yamashima; K. Yabe


Publisher
Elsevier Science
Year
1994
Tongue
English
Weight
410 KB
Volume
253
Category
Article
ISSN
0040-6090

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Optical band gap of zinc nitride films p
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Polycrystalline Zn 3 N 2 films are prepared on Si and quartz glass substrates by RF magnetron sputtering at room temperature. The structural and optical properties are studied by X-ray diffraction and double beam spectrophotometer, respectively. X-ray diffraction indicates that the Zn 3 N 2 films de