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thin films by reactive magnetron sputtering

✍ Scribed by Hellgren, Niklas; Johansson, Mats P.; Broitman, Esteban; Hultman, Lars; Sundgren, Jan-Eric

Book ID
121665242
Publisher
The American Physical Society
Year
1999
Tongue
English
Weight
479 KB
Volume
59
Category
Article
ISSN
1098-0121

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Aluminium nitride thin films deposited b
Aluminium nitride thin films deposited by DC reactive magnetron sputtering
✍ V. Dimitrova; D. Manova; T. Paskova; Tz. Uzunov; N. Ivanov; D. Dechev πŸ“‚ Article πŸ“… 1998 πŸ› Elsevier Science 🌐 English βš– 375 KB

AlN-films prepared by dc reactive magnetron sputtering. AlN in an Ar+N 2 gas mixture have been prepared and their microstructure, hardness, refractive index and IR transmittance examined. At l = 640 nm the refractive index was 1.93 and k = 3Γ—10 -3 ; high transmission occurred between [??] structure