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Nucleation and initial growth kinetics of GaN on sapphire substrate by hydride vapor phase epitaxy

✍ Scribed by F Dwikusuma; J Mayer; T.F Kuech


Book ID
108341999
Publisher
Elsevier Science
Year
2003
Tongue
English
Weight
534 KB
Volume
258
Category
Article
ISSN
0022-0248

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Freestanding GaN wafers were produced by a newly developed self-separation method. Thick GaN layers were grown using hydride vapor phase epitaxy on a sapphire substrate with GaN seeds. The separation of the thick GaN layers took place during the growth sequence at the interface of GaN/sapphire, beca