Freestanding GaN wafers were produced by a newly developed self-separation method. Thick GaN layers were grown using hydride vapor phase epitaxy on a sapphire substrate with GaN seeds. The separation of the thick GaN layers took place during the growth sequence at the interface of GaN/sapphire, beca
The influence of sapphire substrate orientation on crystalline quality of GaN films grown by hydride vapor phase epitaxy
โ Scribed by Anatolij Govorkov; Alexsandr Donskov; Lev Diakonov; Yulia Kozlova; Sergej Malahov; Alexsandr Markov; Mikhail Mezhennyi; Vladimir Pavlov; Alexsandr Polykov; Tatiana Yugova
- Publisher
- Elsevier Science
- Year
- 2009
- Tongue
- English
- Weight
- 311 KB
- Volume
- 404
- Category
- Article
- ISSN
- 0921-4526
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We report on time-integrated and time-resolved photoluminescence (PL) measurements in 80 mm thick GaN layers grown by hydride vapor phase epitaxy on sapphire substrates. The PL spectra are dominated by free exciton transitions and by three well-resolved emissions assigned to the neutral-donor-bound
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