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New negative tone resists for subhalf micron lithography

✍ Scribed by H. Sachdev; R. Kwong; L. Linehan; W. Conley; S. Miura; R. Smith; A. Katnani

Publisher: Elsevier Science
Year: 1994
Tongue: English
Weight: 440 KB
Volume: 23
Category: Article
ISSN: 0167-9317
DOI: 10.1016/0167-9317(94)90165-1

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