✦ LIBER ✦
Silylated positive tone resists for EUV lithography at 14 nm
✍ Scribed by G.N. Taylor; R.S. Hutton; S.M. Stein; C.H. Boyce; B. La Fontaine; A.A. MacDowell; O.R. Wood II; D.R. Wheeler; G.D. Kubiak
- Publisher
- Elsevier Science
- Year
- 1994
- Tongue
- English
- Weight
- 243 KB
- Volume
- 23
- Category
- Article
- ISSN
- 0167-9317
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